ব্র্যান্ডের নাম: | ZMSH |
MOQ.: | 1 |
মূল্য: | by case |
প্যাকেজিংয়ের বিবরণ: | কাস্টম কার্টন |
অর্থ প্রদানের শর্তাবলী: | টি/টি |
The Silicon Carbide (SiC) Horizontal Process Tube is the primary pressure boundary and clean process chamber used in high-temperature gas-phase reactions and heat treatment for semiconductor, photovoltaic, and advanced materials manufacturing.
The product adopts a 3D-printed monolithic SiC body + CVD SiC functional coating architecture, combining high thermal conductivity, low contamination, high mechanical strength, and chemical durability. It is optimized for processes that demand low particle/gas contamination, excellent temperature uniformity, and long-term stability.
Core value:
Push the tool’s temperature uniformity, cleanliness, and OEE to a higher level.
Extend replacement intervals and shorten cleaning downtime to optimize Total Cost of Ownership (TCO).
Provide a long-life, low-risk chamber solution for oxidative and chlorine-bearing chemistries at elevated temperature.
Working atmospheres
Reactive gases: oxygen (O₂) and other oxidizing mixtures
Carrier/protective gases: nitrogen (N₂) and high-purity inert gases
Compatible species: trace chlorine-bearing gases (concentration and residence time controlled by recipe)
Typical processes: dry/wet oxidation, anneal, diffusion, LPCVD/CVD deposition, surface activation/modification, PV passivation, functional thin-film formation, carbonization/nitridation, etc.
Temperature range: ambient to 1250 °C (recommend 10–15% safety margin depending on heater design and ΔT constraints)
Pressure range: from slight vacuum/LPCVD negative pressure to near-atmospheric positive pressure (final rating per PO/spec).
Monolithic SiC body (additive manufactured)
High-density β-SiC or multi-phase SiC; single-piece construction eliminates seams and braze joints that can create micro-leaks or stress concentrators.
High thermal conductivity (vs. alumina/quartz) supports rapid thermal response and improved axial/radial uniformity.
Low, stable CTE yields better high-temperature dimensional stability and seal integrity.
CVD SiC functional coating
In-situ deposited, dense and ultra-pure (surface/coating impurities < 5 ppm); minimizes particle shedding and metal ion release.
Outstanding chemical inertness toward oxidizing and chlorine-bearing gases; mitigates wall attack and re-deposition.
Zonal thickness tailoring available to balance corrosion resistance with thermal response.
Composite benefits
Body provides mechanical support + heat conduction; coating provides corrosion resistance + cleanliness—a system-level optimum for reliability and throughput.
Max continuous use temperature: 1250 °C
Substrate (bulk body) total impurities: < 300 ppm
CVD SiC coating/surface impurities: < 5 ppm
Dimensional tolerances (typical): OD ±0.3–0.5 mm; coaxiality ≤ 0.3 mm/m (tighter upon request)
Inner-wall roughness: Ra ≤ 0.8–1.6 µm (fine polish / near-mirror optional)
Leak tightness (helium): ≤ 1×10⁻⁹ Pa·m³/s (per tool class)
Thermal shock stability: supports repeated hot-cold cycling with no visible cracking or spallation (type-test report supplied)
Cleanliness: final clean/assembly in ISO Class 5–6 environment; particle and metal ion residues certified per customer spec.
Geometry: OD 50–400 mm (larger on evaluation), long-length one-piece bodies; wall thickness optimized for strength/weight/heat flux.
Ends & interfaces: flanges, bell-mouth, bayonet, locating rings, O-ring grooves, pump-out/pressure ports—tailored to your frames/jigs.
Functional ports: thermocouple feedthrough preparation, sight window seats, bypass gas inlets (all with high-temp, leak-tight design).
Coating strategies: inner wall (default), outer wall, or full coverage; local shielding/graded thickness for high-impingement zones.
Surface & cleanliness: roughness grade, ultrasonic/DI clean, drying/bake curves configurable.
Ancillaries: graphite/ceramic/metal flanges, seals, locating fixtures, handling sleeves and storage cradles.
Metric | SiC Tube | Quartz Tube | Alumina Tube | Graphite Tube |
---|---|---|---|---|
Thermal conductivity | High (uniform field) | Low | Low | High |
High-temp strength/creep | Excellent | Fair | Good | Good (oxidation-sensitive) |
Thermal shock | Excellent | Weak | Moderate | Excellent |
Cleanliness / metal ions | Excellent (low) | Moderate | Moderate | Poor |
Oxidation & Cl-chemistry | Excellent | Fair | Good | Poor (oxidizes) |
Cost vs. service life | Medium / long life | Low / short | Medium / medium | Medium / env-limited |
Q1. Why monolithic 3D-printed SiC?
A. Eliminates seams/brazes that cause leaks and stress peaks; enables complex geometries with repeatable dimensions.
Q2. Will Cl-bearing gases attack SiC?
A. CVD SiC is highly inert to most Cl species within specified temperature/partial pressure/residence limits. Use local thickening in high-impingement zones and ensure robust purge/exhaust design.
Q3. What are the practical gains vs. quartz?
A. Longer life, better uniformity, lower particles/metal ions, and better TCO—especially above ~900 °C and in oxidizing/Cl environments.
Q4. Is fast ramping supported?
A. Yes, with controlled max ΔT and rates; pair high-κ body + thin coating, and follow first-use bake SOP.
Q5. When should a tube be retired?
A. Trigger on any of: flange/edge cracks, coating pits/spall, rising leak rate, drifted temperature profile, abnormal particle events.